X-Ray Diffraction (XRD)

In X-Ray diffration techniques an X-ray beam is used to analyze mainly crystalline materials with an ordered periodical crystal structure by observing the scattering angle and intensity. All type of samples such as metals, ceramics, nanoparticles and thin films can be investigated. Various information can be achieved from samples by X-ray diffraction:

  • Qualitative phase content
  • Quantitative phase content by Rietveld analysis
  • Microstructure (crystallite size, microstress)
  • Crystallographic texture
  • Residual stress
  • Amorphous content
  • In situ investigations at high temperature up to 900 °C
  • Thickness of thin films on semiconductors (X-ray reflectometry XRR)

We are equipped with three diffractometers for specific X-ray diffraction:

Siemens D5000
Wavelength: Cr Ka, Cu Ka | Primary Optics: polycapillary optic | Detector: scintillation counter | Specific Equipment: eulerian cradle
Bruker D8 Discover Series II with GADDS-Configuration (General Area Detector Diffraction System)
Wavelength: Cu Ka | Primary Optics: goebel mirror and round apertures for area resolved measurments | Detector: 2D-Area Detector Vantec-500 | Specific Equipment: Laser-video-focusing-system; High Temperature stage up to 900 °C
Bruker D8 Discover Da Vinci
Wavelength: Cr Ka, Mo Ka | Primary Optics: goebel mirror optics e.g. for gracing incidence x-ray diffraction (GIXRD); fixed and variable divergence slits for power diffraction in Bragg-Brentano-geometry | Detector: silicon strip detector Lynxeye XE-T with energy discrimination | Specific Equipment: powder sample stage, transmission sample stage, vacuum chuck for x-ray reflectometry (XRR)

 

Contact

Dr. Andreas Richter | +49 7171 1006-402
richter@fem-online.de